![]() In the case of etching of metal atoms, the ones that remains at the substrate surface will form bonds. This argon atoms do not form bonds due to the closed electron shell and can coalesce to small bubbles due to the heat induced on the cutting tool during machining. However, etching with argon ions will result in a weak interface to the coating that is deposited after the cleaning process because some argons remain in the substrate after etching. ![]() Etching with metal ions results in superior interface characterized by an enhanced concentration of the kind of metal ions used for etching. ⚡️Metal ion etching using CAE is highly advantageous due to the use of metal ions instead of argon ions. Etching is also used as a prior step in CAE which also increases the adhesion. ![]() The high adhesion in CAE is due to the high ionization degree of the depositing vapor resulting in high surface energy. ⚡️The adhesion in CAE is excellent and using a scratch test. * and whether or not the process is done in pulsed or DC mode. * temperature and bias voltage at the substrate * ionization and dissociation potential of the reactive gas * use or not of an inert working gas such as argon ⚡️The deposition rate can be around 70 nm/min and depend on the The compounds are deposited with CAE by admitting a reactive gas into the vacuum chamber that will react with the metal vapor at the surface of the substrate. ![]() ![]() ⚡️Most of the decorative coatings with PVD are compounds. Decorative coatings by PVD - cathodic arc evaporation (CAE) ⚡️ ![]()
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